Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride FilmsR.C. TaylorB.A. Scott2019JES
Composition Determination of Electrodeposited NiSn and PbSn Alloys Using Stripping Voltammetry at a Rotating Ring-Disk ElectrodeK.H. WongP.C. Andricacos2019JES
In Situ X-Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered ALCr Thin Films Under Electrochemical ControlA.J. DavenportH.S. Isaacset al.2019JES
Optimization of Electrodeposit Uniformity by the Use of Auxiliary ElectrodesS. MehdizadehJ. Dukovicet al.2019JES
Photochemically Generated Gold Catalyst for Selective Electroless Plating of CopperThomas H. Baum2019JES
Reactive ion Etching of Silicon and Silicon Dioxide in CF4 Plasmas Containing H2 or C2F4 AdditivesJ.P. Simko2019JES
Phosphorus-Doped Polycrystalline Silicon via LPCVD: I. Process CharacterizationB.S. MeyersonW.L. Olbricht2019JES