A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
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PtSi-Induced Junction Leakage
- J.P. Gambino
- M.D. Monkowski
- et al.
- 2019
- JES
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
Thermally Developable, Positive Resist Systems with High Sensitivity
- Hiroshi Ito
- Reinhold Schwalm
- 2019
- JES
Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride Films
- R.C. Taylor
- B.A. Scott
- 2019
- JES
Electro-Oxidation of Formaldehyde on Thermally Prepared RuO2 and Other Noble Metal Oxides
- Eugene J. M. O'Sullivan
- James R. White
- 2019
- JES
Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography
- Hiroshi Ito
- Mitsuru Ueda
- et al.
- 2019
- JES
The Corrosion of Carbon Black Anodes in Alkaline Electrolyte IV. Current Efficiencies for Oxygen Evolution from Metal Oxide-impregnated Graphitized Furnace Blacks
- Harvey Sokol
- Philip N. Ross
- 2019
- JES
Corrosion of Thin Film Magnetic Disk: Galvanic Effects of the Carbon Overcoat
- D. Edmonson
- Michael A. Russak
- et al.
- 2019
- JES
Polyaniline: A Very Fast Electrochromic Material
- J.C. Lacroix
- K.K. Kanazawa
- et al.
- 2019
- JES