Reactive ion etching of silicon using bromine containing plasmas
- Tim D. Bestwick
- Gottlieb S. Oehrlein
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetics and mechanics of Si2H6 surface decomposition on Si
- C.M. Greenlief
- H.H. Sawin
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Spontaneous decomposition of dimethyl gold hexafluoroacetylacetonate on ion bombarded surfaces
- A. Wagner
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Process effects on radio frequency diode reactively sputtered ZrO2films
- M.M. Yang
- T.M. Reith
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Ta as a barrier for the Cu/PtSi, Cu/Si, and Al/PtSi structures
- Chin-An Chang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nanomechanics of a Au-lr contact using a bidirectional atomic force microscope
- Sidney R. Cohen
- Gabi Neubauer
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma induced gas heating in electron cyclotron resonance sources
- S.M. Rossnagel
- S.J. Whitehair
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Thermal roughening studied by scanning tunneling microscopy
- J.W.M. Frenken
- R.J. Hamers
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Energetic particle bombardment of films during magnetron sputtering
- S.M. Rossnage
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
TIN formed by ion beam nitriding of TiSi2
- S.E. Harnstrarn
- D. Moy
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films