Proximity effects and influences of nonuniform illumination in projection lithography
- P.D. Robertson
- F.W. Wise
- et al.
- 1989
- Proceedings of SPIE 1989
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233 results at Proceedings of SPIE 1989
Ultrafast high resolution contact lithography using excimer lasers
- K. Jain
- B.J. Lin
- 1989
- Proceedings of SPIE 1989
Resist characterization: Procedures, parameters, and profiles
- M. Exterkamp
- W. Wong
- et al.
- 1989
- Proceedings of SPIE 1989
Cryogenic frequency domain optical mass memory
- G.C. Bjorklund
- W. Lenth
- et al.
- 1989
- Proceedings of SPIE 1989
Trends in x-ray lithography
- Juan R. Maldonado
- 1989
- Proceedings of SPIE 1989
Electron beam testing and its application to packaging modules for very large scale integrated (vlsi) chip arrays
- F.J. Hohn
- T.H.P. Chang
- et al.
- 1989
- Proceedings of SPIE 1989
Optics and holography in the IBM supermarket scanner
- Leroy D. Dickson
- Glenn T. Sincerbox
- 1989
- Proceedings of SPIE 1989
Imaging performance of a normal incidence x-ray telescope measured at 0.18 kev
- J.P. Henry
- Eberhard Spiller
- et al.
- 1989
- Proceedings of SPIE 1989
Applications of fiber optics to computer systems
- Martin W. Sachs
- 1989
- Proceedings of SPIE 1989
Single and dual wavelength exposure of photoresist
- J. LaRue
- C. Ting
- 1989
- Proceedings of SPIE 1989