The Analysis of Diffusion Data by a Method of Moments
- R. Ghez
- J.D. Fehribach
- et al.
- 2019
- JES
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Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
Corrosion Processes in Magneto-optic Films
- M.M. Farrow
- E.E. Marinero
- 2019
- JES
Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage
- B.S. Lee
- H. Baratte
- 2019
- JES
Dependence of the Flatband Voltage of Si-MOS on Distribution of Cesium in SiO2 Comparison of Two Implantation Methods
- L. Krusin-Elbaum
- 2019
- JES
Redeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
A Mathematical Model for Silicide Oxidation
- S.-L. Zhang
- R. Ghez
- et al.
- 2019
- JES
Various Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
Electrochemistry of Chromium-Metalloid Alloys in Sulfuric Acid—II
- R.R. Ruf
- 2019
- JES
Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES