Plasma characterization of an electron cyclotron resonance-radio-frequency hybrid plasma reactor
- Young H. Lee
- John E. Heidenreich
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Thin-film topography control with transient liquid underlayer
- Igor Y. Khandros
- Robert J. Baseman
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Structure of the Si(111)/CaF2 interface
- R.M. Tromp
- M.C. Reuter
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Radical formation and surface reaction induced by laser radiation in the C11212-Al system
- A. Modi
- K. Domen
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reaction kinetics of surface silicon hydrides
- C. Michael Greenlief
- Stephen M. Gates
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive magnetron sputtered zirconium oxide and zirconium silicon oxide thin films
- Michael A. Russak
- Christopher V. Jahnes
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
interface states and Schottky barrier formation at metal/GaAs junctions
- R.E. Viturrc
- C. Mailhiot
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The angular dependence of preferential sputtering and composition in aluminum-copper thin films
- P. Rudeck
- J.M.E. Harper
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of aluminum oxide
- Fletcher Jones
- Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- J.M.E. Harper
- S.E. Harnstram
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films