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Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor PreparationM.S. Crowder2019JES
A Diffusion Model for Electron-Hole Recombination in Zn2SiO4:(Mn, As) PhosphorsD.J. RobbinsN. Caswellet al.2019JES
The Properties of electrochromic film electrodes of lanthanide diphthalocyanines in ethylene glycolD.J. Schiffrin2019JES
Process Damage and Contamination Effects for Shallow Si Implanted GaAsH. BaratteA.J. Fleischmanet al.2019JES
Epitaxial Growth and Selectivity of AlxGa1-xAs Using Novel Metalorganic PrecursorsM.S. GoorskyT.F. Kuechet al.2019JES
An XPS and TEM Study of Intrinsic Adhesion Between Polyimide and Cr FilmsN.J. ChouD.W. Donget al.2019JES
Near-Surface Damage and Contamination after CF4/H2 Reactive Ion Etching of SiG.S. OehrleinR.M. Trompet al.2019JES