Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
Publications
3509 results for Materials Discovery
Chemical bonding and reaction at metal/polymer interfaces
- P.S. Ho
- P.O. Hahn
- et al.
- 1985
- JVSTA
Summary Abstract: Titanium silicide films prepared by reactive sputtering
- V. Deline
- F.M. d’Heurle
- 1985
- JVSTA
The etching of W(111) with XeF2
- Harold F. Winters
- 1985
- JVSTA
The etching of Cu(100) with Cl2
- Harold F. Winters
- 1985
- JVSTA
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver films
- T.C. Huang
- G. Lim
- et al.
- 1985
- JVSTA
Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- K. Kehler
- J.W. Coburn
- et al.
- 1985
- JVSTA
Interdiffusion at the polyimide-Cu interface
- R.M. Tromp
- F. Leqoues
- et al.
- 1985
- JVSTA