Driving down defect density in composite EUV patterning film stacksLuciana MeliKaren Petrilloet al.2017SPIE Advanced Lithography 2017
Investigation of alternate mask absorbers in EUV lithographyMartin Burkhardt2017SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defectsErik VerduijnPawitter Mangatet al.2017SPIE Advanced Lithography 2017