Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
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23 results at SPIE Advanced Lithography 2017
Reducing line edge roughness in si and sin through plasma etch chemistry optimization for photonic waveguide applications
- Nathan Marchack
- Marwan Khater
- et al.
- 2017
- SPIE Advanced Lithography 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- Ravi Bonam
- Chi Chun Liu
- et al.
- 2017
- SPIE Advanced Lithography 2017