Publications

23 results at SPIE Advanced Lithography 2017

Identification and sensitivity analysis of a correlated ground rule system (design arc)
- - Eric Eastman
  - Dureseti Chidambarrao
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- - Michael Crouse
  - L. Liebmann
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Decomposition of the TCC using non-coherent kernels for faster calculation of lithographic images
- - Alan E. Rosenbluth
- 2017
- SPIE Advanced Lithography 2017
Overlay statistics for multiple exposure patterning
- - Allen H. Gabor
  - Nelson M. Felix
- 2017
- SPIE Advanced Lithography 2017
Printability and actinic AIMS review of programmed mask blank defects
- - Erik Verduijn
  - Pawitter Mangat
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Reaching for the true overlay in advanced nodes
- - Chiew-Seng Koay
  - Bassem Hamieh
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Reducing line edge roughness in si and sin through plasma etch chemistry optimization for photonic waveguide applications
- - Nathan Marchack
  - Marwan Khater
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Mix-and-match considerations for EUV insertion in N7 HVM
- - Xuemei Chen
  - Allen Gabor
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond
- - Derren Dunn
  - John R. Sporre
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017