Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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68 results at J. Photopolym. Sci. Tech.

Chemical amplification resists: Laboratory curiosity to paradigm
- - Hiroshi Ito
- 2007
- J. Photopolym. Sci. Tech.
Trends in patterning materials for advanced lithography
- - Robert D. Allen
- 2007
- J. Photopolym. Sci. Tech.
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- - R.D. Allen
  - G. Breyta
  - et al.
- 2006
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- - William Hinsberg
  - Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Bilayer resists for 193 nm lithography: SSQ and POSS
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Positive resists based on non-polymeric macromolecules
- - Ratnam Sooriyakumaran
  - Hoa Truong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoropolymer resists: Fundamentals and lithographic evaluation
- - Hiroshi Ito
  - H.D. Truong
  - et al.
- 2004
- J. Photopolym. Sci. Tech.