Chemical amplification resists: Laboratory curiosity to paradigm
- Hiroshi Ito
- 2007
- J. Photopolym. Sci. Tech.
Publications
Date
Featured collections
Popular topics
68 results at J. Photopolym. Sci. Tech.
Trends in patterning materials for advanced lithography
- Robert D. Allen
- 2007
- J. Photopolym. Sci. Tech.
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Bilayer resists for 193 nm lithography: SSQ and POSS
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.