Electrical Properties of Chemical-Mechanical Polished Tetraethyl Orthosilicate Films with and Without Capping Layers
- S. Cohen
- M.A. Jaso
- et al.
- 2019
- JES
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Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 Plasmas
- W.A. Lanford
- 2019
- JES
A Self-Aligned, Trilayer, A-Si:H Thin Film Transistor Prepared from Two Photomasks
- Yue Kuo
- 2019
- JES
Principal Component Analysis of Optical Emission Spectroscopy and Mass Spectrometry: Application to Reactive Ion Etch Process Parameter Estimation Using Neural Networks
- Reza Shadmehr
- David Angell
- et al.
- 2019
- JES
X-Ray Absorption Study of Electrochemically Grown Oxide Films on Al-Cr Sputtered Alloys: I. Ex situ Studies
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
Correlation of Surface Wettability and Corrosion Rate for Benzotriazole-Treated Copper
- Richard R. Thomas
- Vlasta A. Brusic
- et al.
- 2019
- JES
Chemical Surface-Modification of a Polyimide: Characterization and a Kinetic Study on the Diffusion of Ions in a Modified Polymer
- Miro M. Plechaty
- Richard R. Thomas
- 2019
- JES
Paramagnetic Point Defects in Amorphous Silicon Dioxide and Amorphous Silicon Nitride Thin Films: II. a-SiNx:H
- F.C. Rong
- E.H. Poindexter
- 2019
- JES
Design principles of bipolar electrochemical co-electrolysis cells for efficient reduction of carbon dioxide from gas phase at low temperature
- Alexandra Patru
- Tobias Binninger
- et al.
- 2019
- JES
Differential inhibition during Cu electrodeposition on Ru: Combined electrochemical and real-time TEM studies
- P. M. Vereecken
- Alex Radisic
- et al.
- 2018
- JES