Plasma etching of niobium with CF4/O2 gases
- Mao-Min Chen
- Run Han Wang
- 1983
- JVSTA
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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- Materials Discovery
3421 results for Materials Discovery
Motion of W marker during sequential compound formation in bimetallic AlCu thin films
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Materials Letters
Summary Abstract: Preparation of Pb-Bi film by alloy evaporation II. Microstructure and morphology
- H.-C.W. Huang
- C.M. Serrano
- 1983
- JVSTA
Electronic structure calculations for atomic and diatomic phases of oxygen chemisorbed on Al(111)
- Inder P. Batra
- O. Bisi
- 1982
- Surface Science
A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment
- E.-A. Knabbe
- J.W. Coburn
- et al.
- 1982
- Surface Science
LEED structure analysis of A √3 × √3 -30° overlayer of iodine on Ag{111}
- M. Maglietta
- E. Zanazzi
- et al.
- 1982
- Surface Science
Random distribution of islands explains the oscillatory intensity in He/Si(111)-(7 × 7)
- N. García
- J.M. Soler
- 1982
- Surface Science
Line shapes and threshold resonances for the scattering of waves from surfaces
- N. García
- W.A. Schlup
- 1982
- Surface Science
General aspects of barrier layers for very-large-scale integration applications I: Concepts
- P.S. Ho
- 1982
- Thin Solid Films
The use of titanium-based contact barrier layers in silicon technology
- C.-Y. Ting
- M. Wittmer
- 1982
- Thin Solid Films