Liquid Crystal Alignment Produced by RF Plasma Deposited Films
- G.J. Sprokel
- R.M. Gibson
- 2019
- JES
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AZ1350J as a Deep-U.V. Mask Material
- B.J. Lin
- 2019
- JES
Effect of Lubricant Environments on Saw Damage in Si Wafers
- T.S. Kuan
- K.K. Shih
- et al.
- 2019
- JES
Pre- and Postepitaxial Gettering of Oxidation and Epitaxial Stacking Faults in Silicon
- M.C. Chen
- V.J. Silvestri
- et al.
- 2019
- JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Oxidation and Corrosion Studies of Fe1-xPdx Films
- Wen-Yaung Lee
- G. Scherer
- et al.
- 2019
- JES
Dry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
Low Energy Ion Beam Etching
- J.M.E. Harper
- J.J. Cuomo
- et al.
- 2019
- JES
Effects of Conductor Stress on Bubble Propagation in Contiguous Disk Devices
- K.Y. Ahn
- S.M. Kane
- 2019
- JES
Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density
- R.S. Horwath
- 2019
- JES