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Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorrA. RayA. Reisman2019JES
All Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related PolymersH. Hiraoka2019JES