PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device PerformanceYue Kuo1995JES
Low Temperature Atmospheric Pressure Chemical Vapor Deposition for Epitaxial Growth of SiGe Bipolar TransistorsD.A. GrutzmacherD.A. Grutzmacher1995JES
Alloying of a Less Noble Metal in Electrodeposited Cu Through Underpotential DepositionHariklia DeligianniI-Chia Hsu Changet al.1995JES