Gel resist processing for submicron CMOS and bipolar circuits
- K.E. Petrillo
- M. Smyth
- et al.
- 1989
- Proceedings of SPIE 1989
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233 results at Proceedings of SPIE 1989
Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors
- Hiroshi Ito
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Sub-picosecond raman spectroscopy of semiconductors
- J.C. Tsang
- J.A. Kash
- 1989
- Proceedings of SPIE 1989
Chemical and physical aspects of multilayer resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1989
- Proceedings of SPIE 1989
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
Aqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Critical issues in high density magnetic and optical data storage
- Alan E. Bell
- 1989
- Proceedings of SPIE 1989
Soft vacuum pulsed electron beam processing of teflon and teflon-like films
- J. Krishnaswamy
- G.J. Collins
- et al.
- 1989
- Proceedings of SPIE 1989
Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing
- Eberhard Spiller
- 1989
- Proceedings of SPIE 1989