Phase change materials and their application to random access memory technology
- Simone Raoux
- Robert M. Shelby
- et al.
- 2008
- Microelectronic Engineering
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Extensive investigations of temperature influence on barrier integrity during reliability testing
- O. Aubel
- M.A. Meyer
- et al.
- 2008
- Microelectronic Engineering
Fabrication and characterization of Ta2O5 photonic feedback structures
- T. Wahlbrink
- J. Bolten
- et al.
- 2008
- Microelectronic Engineering
Minimizing linewidth roughness in Step and Flash Imprint Lithography
- Niyaz Khusnatdinov
- Gerard M. Schmid
- et al.
- 2008
- Microelectronic Engineering
Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
- C. Torregiani
- C. Van Bockstael
- et al.
- 2007
- Microelectronic Engineering
Dopant segregation in SOI Schottky-barrier MOSFETs
- J. Knoch
- M. Zhang
- et al.
- 2007
- Microelectronic Engineering
Ni-Pt silicide formation through Ti mediating layers
- Paul Besser
- Christian Lavoie
- et al.
- 2007
- Microelectronic Engineering
Recent advances and current challenges in the search for high mobility band-edge high-k/metal gate stacks
- V. Narayanan
- V.K. Paruchuri
- et al.
- 2007
- Microelectronic Engineering
In-situ MBE Si as passivating interlayer on GaAs for HfO2 MOSCAP's: effect of GaAs surface reconstruction
- D.J. Webb
- J. Fompeyrine
- et al.
- 2007
- Microelectronic Engineering
SrHfO3 as gate dielectric for future CMOS technology
- C. Rossel
- M. Sousa
- et al.
- 2007
- Microelectronic Engineering