Reactively sputter-deposited and coevaporated TeOx thin films for optical recordingW.-Y. LeeF.O. Sequedaet al.1986JVSTA
Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couplesH.-O. BlomS. Berget al.1985JVSTA
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporationD.S. YeeJ. Floroet al.1985JVSTA
Summary Abstract: Investigation of the interface chemistry of titanium-tungsten Schottky barrier contacts to silicon by Auger spectroscopyJ.E. LewisM.O. Aboelfotohet al.1985JVSTA
Highly selective argon-oxygen ion beam etching process for Pb alloysD.F. MooreH.P. Dietrichet al.1985JVSTA