Characterization of imaging performance for immersion lithography at NA=0.93
- 2006
- SPIE Advanced Lithography 2006
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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16 results at SPIE Advanced Lithography 2006
Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
Lithography process optimization using linear superposition of commonly available illumination modes
- Michael M. Crouse
- Yasri Yudhistira
- et al.
- 2006
- SPIE Advanced Lithography 2006
DFM requirements and solution roadmaps: The multi-layer approach
- Juan Antonio Carballo
- Sani Nassif
- 2006
- SPIE Advanced Lithography 2006
Silicon IP reuse standards for design for manufacturability
- Juan Antonio Carballo
- Savithri Sundareswaran
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
Phase calibration for attenuating phase-shift masks
- Michael S. Hibbs
- Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Self assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- C.T. Black
- R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006