A study of electromigration lifetime for Cu interconnects coated with CoWP, Ta/TaN, or SiC xN yH zC.-K. HuD. Canaperiet al.2003AMC 2003
Simulation of the deposition of BCC metals including anistropic effects using 3D-filmsT. SmyR.V. Joshi2003AMC 2003
Growth of crystalline defects on the surface of FSG dielectricsJ.P. GambinoJ. Burnhamet al.2003AMC 2003
Analysis of an extreme low-κ organosilicate dielectric film exposed to representative plasmas and to a restorative processM. ColburnS.V. Nittaet al.2003AMC 2003
Backend implications for thermal effects in 3d integrated soi structuresD. CeloR.V. Joshiet al.2003AMC 2003