Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
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7 results at Microlithography 2000
193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- R. Sooriyakumaran
- D. Fenzel-Alexander
- et al.
- 2000
- Microlithography 2000
Real-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
- G.M. Poliskie
- et al.
- 2000
- Microlithography 2000
Synthesis and lithographic performance of poly-4-hydroxyphenyl ethyl methacrylate based negative resists
- J. Gelorme
- L.L. Kosbar
- et al.
- 2000
- Microlithography 2000
Toward controlled resist line edge roughness: Material origin of line edge roughness in chemically amplified positive-tone resists
- Q. Lin
- R. Sooriyakumaran
- et al.
- 2000
- Microlithography 2000
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Patterning of highly conducting polyaniline films
- T. Graham
- A. Afzali
- et al.
- 2000
- Microlithography 2000