Topology and context-based pattern extraction using line-segment Voronoi diagram
- Sandeep Kumar Dey
- Panagiotis Cheilaris
- et al.
- 2015
- SPIE Advanced Lithography 2015
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24 results at SPIE Advanced Lithography 2015
Inverse lithography using sparse mask representations
- Radu C. Ionescu
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- Ştefan Apostol
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Experiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Forbidden pitches: Causes, source optimization, and their role in design rules
- Ştefan Apostol
- Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Low-energy electron (0-100eV) interaction with resists using LEEM
- A. Thete
- Daniël Geelen
- et al.
- 2015
- SPIE Advanced Lithography 2015
Best focus shift mechanism for thick masks
- Martin Burkhardt
- Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- Eri Hirahara
- Margareta Paunescu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Implementation of assist features in EUV lithography
- Fan Jiang
- Martin Burkhardt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- Chi Chun Liu
- Fee Li Lie
- et al.
- 2015
- SPIE Advanced Lithography 2015