Topology and context-based pattern extraction using line-segment Voronoi diagram
- Sandeep Kumar Dey
- Panagiotis Cheilaris
- et al.
- 2015
- SPIE Advanced Lithography 2015
Publications
Date
Featured collections
Popular topics
24 results at SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- Ştefan Apostol
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Experiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Forbidden pitches: Causes, source optimization, and their role in design rules
- Ştefan Apostol
- Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Inverse lithography using sparse mask representations
- Radu C. Ionescu
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2015
- SPIE Advanced Lithography 2015
Scatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Methodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2015
- SPIE Advanced Lithography 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- Scott D. Halle
- Luciana Meli
- et al.
- 2015
- SPIE Advanced Lithography 2015
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- SPIE Advanced Lithography 2015