Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results at SPIE Advanced Lithography 2010

Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- - Scott Halle
  - Daniel Moore
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Hybrid reference metrology exploiting patterning simulation
- - Narender Rana
  - Chas Archie
- 2010
- SPIE Advanced Lithography 2010
CD-SEM metrology of spike detection on sub-40 nm contact holes
- - Yoshinori Momonoi
  - Taro Osabe
  - et al.
- 2010
- SPIE Advanced Lithography 2010
3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- - Johann Foucher
  - Narender Rana
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: Tool-to-tool comparison
- - Gregory McIntyre
  - Richard Tu
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Smaller, smarter, faster, and more accurate: The new overlay metrology
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- - Alok Vaid
  - Matthew Sendelbach
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Direct write 3-dimensional nanopatterning using probes
- - David Pires
  - Armin Knoll
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Self-assembling materials for lithographic patterning: Overview, status and moving forward
- - William Hinsberg
  - Joy Cheng
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Spacer defined double patterning for sub-72 nm pitch logic technology
- - Ryoung-Han Kim
  - Erin McLellan
  - et al.
- 2010
- SPIE Advanced Lithography 2010