Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
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15 results at SPIE Advanced Lithography 2010
Hybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
CD-SEM metrology of spike detection on sub-40 nm contact holes
- Yoshinori Momonoi
- Taro Osabe
- et al.
- 2010
- SPIE Advanced Lithography 2010
3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: Tool-to-tool comparison
- Gregory McIntyre
- Richard Tu
- et al.
- 2010
- SPIE Advanced Lithography 2010
Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- SPIE Advanced Lithography 2010
Direct write 3-dimensional nanopatterning using probes
- David Pires
- Armin Knoll
- et al.
- 2010
- SPIE Advanced Lithography 2010
Self-assembling materials for lithographic patterning: Overview, status and moving forward
- William Hinsberg
- Joy Cheng
- et al.
- 2010
- SPIE Advanced Lithography 2010
Spacer defined double patterning for sub-72 nm pitch logic technology
- Ryoung-Han Kim
- Erin McLellan
- et al.
- 2010
- SPIE Advanced Lithography 2010