Ultrathin high-K gate stacks for advanced CMOS devices
- E. Gusev
- D.A. Buchanan
- et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Publications
5 results at Technical Digest - International Electron Devices Meeting
Noise performance and considerations for integrated RF/analog/mixed-signal design in a high-performance SiGe BiCMOS technology
- D.R. Greenberg
- S. Sweeney
- et al.
- 2001
- Technical Digest - International Electron Devices Meeting
A physical model for implanted nitrogen diffusion and its effect on oxide growth
- Lahir Shaik Adam
- Mark E. Law
- et al.
- 2000
- Technical Digest - International Electron Devices Meeting
A high aspect-ratio silicon substrate-via technology and applications: Through-wafer interconnects for power and ground and faraday cages for SOC isolation
- Joyce H. Wu
- Jesds A. Del Alamo
- et al.
- 2000
- Technical Digest - International Electron Devices Meeting
Enhanced secondary electron injection in novel SiGe flash memory devices
- D.L. Kencke
- X. Wang
- et al.
- 2000
- Technical Digest - International Electron Devices Meeting