Nelson Felix

Publications

• Nanosheet Metrology Opportunities for Technology Readiness

  • • Mary Breton
    • Daniel Schmidt
    • et al.
  • 2021
  • SPIE Advanced Lithography 2021

• Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

  • • Jennifer Church
    • Luciana Meli
    • et al.
  • 2020
  • J. Micro/Nanolithogr. MEMS MOEMS

• Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch

  • • Jennifer Church
    • Luciana Meli
    • et al.
  • 2020
  • SPIE Advanced Lithography 2020

• Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning

  • • Dexin Kong
    • Daniel Schmidt
    • et al.
  • 2020
  • SPIE Advanced Lithography 2020

• Exploration of pillar local CDU improvement options for AI applications

  • • Charlie Liu
    • Hao Tang
    • et al.
  • 2020
  • SPIE Advanced Lithography 2020

• Overlay error statistics for multiple-exposure patterning

  • • Allen Gabor
    • Nelson Felix
  • 2019
  • J. Micro/Nanolithogr. MEMS MOEMS

• Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterning

  • • Chi Chun Liu
    • Richard Farrell
    • et al.
  • 2019
  • MEMS/NEMS/MOEMS 2019

• LCDU improvement of EUV-patterned vias with DSA

  • • Jing Guo
    • Dustin W. Janes
    • et al.
  • 2019
  • MEMS/NEMS/MOEMS 2019

• Investigation of mask absorber induced image shift in EUV lithography

  • • Martin Burkhardt
    • Anuja De Silva
    • et al.
  • 2019
  • SPIE Advanced Lithography 2019

• Fundamentals of resist stochastics effect for single-expose EUV patterning

  • • Anuja De Silva
    • Luciana Meli
    • et al.
  • 2019
  • SPIE Advanced Lithography 2019