Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
A 23.8-GHz tuned amplifier is demonstrated in a partially scaled 0.1-μm silicon-on-insulator CMOS technology. The fully integrated three-stage amplifier employs a common-gate, source-follower, and cascode with on-chip spiral inductors and MOS capacitors. The gain is 7.3 dB, while input and output reflection coefficients are -45 and -9.4 dB, respectively. Positive gain is exhibited beyond 26 GHz. The amplifier draws 53 mA from a 1.5-V supply. The measured on-wafer noise figure is 10 dB, while the input-referred third-order intercept point is -7.8 dBm. The results demonstrate that 0.1-μm CMOS technology may be used for 20-GHz RF applications and suggest even higher operating frequencies and better performance for further scaled technologies.
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Peter J. Price
Surface Science
J. Tersoff
Applied Surface Science
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT