Chris Progler, Michael Green, et al.
SPIE Advanced Lithography 2019
A characterization approach has been developed for evaluating stochastic printing failures in EUV contact holes. Demand for consistent yield exceeding 10 billion contacts requires robust process co-optimization with a focus on stochastic defect reduction throughout the patterning process flow. To monitor and quantify failure rates across process points, implementation of a holistic approach for accurate and high-throughput methodologies is proposed.
Chris Progler, Michael Green, et al.
SPIE Advanced Lithography 2019
Karen Petrillo, Dave Hetzer, et al.
ANTS 2019
Graham Jensen, Vidyasagar Anantha, et al.
ASMC 2021
Chris Robinson, Cody Murray, et al.
SPIE Advanced Lithography 2020