Keith A. Jenkins, Karthik Balakrishnan, et al.
IEEE Electron Device Letters
The pronounced impact of process uncertainties on the power-performance characteristics of systems has necessitated characterization and design efforts that aim to maximize the parametric yield of the design. This paper describes a completely digital on-chip technique to measure local random variation of FET current. The measurement circuit consists of a series connection of an array of independently selectable devices and a single common load device. The voltage at the intermediate node indicates the variation from device to device, and is digitized by a voltage-controlled oscillator and on-chip frequency counters. This eliminates analog current measurements and enables very rapid, all-digital measurement of single FET variability, which can also be carried out in the field. The effectiveness of the technique is illustrated using measurements results from a test chip designed in a 45-nm SOI process. © 2006 IEEE.
Keith A. Jenkins, Karthik Balakrishnan, et al.
IEEE Electron Device Letters
Phillip J. Restle, Craig A. Carter, et al.
ISSCC 2002
Chirag S. Patel, Paul S. Andry, et al.
IITC 2005
Aditya Bansal, Kai Zhao, et al.
IRPS 2011