J. Tersoff
Applied Surface Science
The atomic structure of the Al–Si epitaxial interface has been investigated by high-resolution transmission electron microscopy combined with computer image-simulation techniques. A stable epitaxial structure was observed at the Al(111)–Si(111) interface with a matching of four Al to three Si lattice planes, corresponding to a misfit of 30%. The formation of an epitaxial interface with such a large misfit is unexpected and its Occurrence can be attributed to the optimum energy of this interface. Atomic models consistent with these observations are proposed. © 1986 Taylor & Francis Group, LLC.
J. Tersoff
Applied Surface Science
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
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SPIE Advances in Semiconductors and Superconductors 1990