F.M. D'Heurle
Journal of Applied Physics
Paper
Electromigration of Ni in Al thin-film conductors
Abstract
An analysis of mass transport during electromigration in Al+Ni thin-film conductors indicates an anomalously large grain-boundary diffusivity of Ni in Al+Ni. This large value may be explained if the grain-boundary adsorption coefficient for solute atoms is assumed to be inversely proportional to the solubility limit.
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