S. Rice, K. Jain
Applied Physics A Solids and Surfaces
Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.
S. Rice, K. Jain
Applied Physics A Solids and Surfaces
R.T. Kerth, K. Jain, et al.
IEEE Electron Device Letters
M.R. Latta, T.C. Strand, et al.
SPIE Optical Data Storage Topical Meeting 1992
M.R. Latta, S.L. Heesacker
Proceedings of SPIE 1989