Frequency doubling in KB5O84H2O and NH4B5O84H2O to 217.3 nm

C.F. Dewey Jr.; W.R. Cook Jr.; R.T. Hodgson; J.J. Wynne

doi:10.1063/1.88047

Applied Physics Letters

Paper

02 Sep 2008

Frequency doubling in KB₅O₈4H₂O and NH₄B₅O₈4H₂O to 217.3 nm

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Abstract

We have produced tunable phase-matched second-harmonic radiation in a KB5O84H2O crystal between 217.3 and 234.5 nm. Phase matching was achieved by crystal rotation. We also studied frequency doubling in NH4B5O84H2O.

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Laser annealing of silicon implanted with both argon and arsenic

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Time dependence of the reflectivity of Si at 633 and 488 nm during pulsed laser annealing

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High-frequency operation of heavily carbon-doped Ga_0.51In _0.49P/GaAs surface-emitting light-emitting diodes grown by metalorganic molecular beam epitaxy

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Abstract

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Laser annealing of silicon implanted with both argon and arsenic

Time dependence of the reflectivity of Si at 633 and 488 nm during pulsed laser annealing

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High-frequency operation of heavily carbon-doped Ga_0.51In _0.49P/GaAs surface-emitting light-emitting diodes grown by metalorganic molecular beam epitaxy