Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
This paper is an overview of the designs of high-numerical-aperture lenses for optical projection lithography at the IBM Thomas J. Watson Research Center.
Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
Michael C. McCord, Violetta Cavalli-Sforza
ACL 2007
B. Wagle
EJOR
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004