R. Ghez, J.S. Lew
Journal of Crystal Growth
A combination of diblock copolymer self-assembly and state-of-the-art semiconductor device fabrication methods is used to create highly uniform suspended porous silicon membranes. Integration of these two processing techniques is key to realizing manufacturable high quality devices. Three different methods are shown for adjusting membrane pore dimensions between 10 and 35 nm, allowing device optimization for specific applications. © 2006 American Vacuum Society.
R. Ghez, J.S. Lew
Journal of Crystal Growth
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ADMETA 2011
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