Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A combination of diblock copolymer self-assembly and state-of-the-art semiconductor device fabrication methods is used to create highly uniform suspended porous silicon membranes. Integration of these two processing techniques is key to realizing manufacturable high quality devices. Three different methods are shown for adjusting membrane pore dimensions between 10 and 35 nm, allowing device optimization for specific applications. © 2006 American Vacuum Society.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Lawrence Suchow, Norman R. Stemple
JES
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.