Yang Yang, James Di Sarro, et al.
IRPS 2010
Junction engineering solutions are presented in this work to improve the triggering and performance of SCR devices in an advanced 22nm SOI CMOS technology. Several SCR cathode junction formations are investigated including implants energy, dosage, with or without halo/extension implants. TLP and HBM results are presented in details.
Yang Yang, James Di Sarro, et al.
IRPS 2010
Souvick Mitra, Ephrem Gebreselasie, et al.
EOS/ESD 2015
Junjun Li, Robert Gauthier, et al.
EOS/ESD 2006
James Di Sarro, Kiran Chatty, et al.
IRPS 2007