Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R.W. Gammon, E. Courtens, et al.
Physical Review B
P. Alnot, D.J. Auerbach, et al.
Surface Science
A. Gangulee, F.M. D'Heurle
Thin Solid Films