Mei-Chen Chuang, J.W. Coburn
Journal of Applied Physics
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma-etching discharges and a comparison is made to available data in the literature.
Mei-Chen Chuang, J.W. Coburn
Journal of Applied Physics
E. Occhiello, F. Garbassi, et al.
Plasma Chemistry and Plasma Processing
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
C. Vanneste, C.C. Chi, et al.
Physical Review B