Y.H. Lee, M. Chen
ECS Meeting 1983
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma-etching discharges and a comparison is made to available data in the literature.
Y.H. Lee, M. Chen
ECS Meeting 1983
C.D. Tesche, K.H. Brown, et al.
International Conference on Low Temperature Physics (LT) 1983
J.W. Coburn, Kenneth Lee
Journal of Applied Physics
E.W. Eckstein, J.W. Coburn, et al.
International Journal of Mass Spectrometry and Ion Physics