Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
Demonstrates the importance of using the correct basis functions in evaluating transition matrix elements for many-particle systems containing both electrons and holes and resolves an inconsistency in the theoretically determined oscillator strength ratios for radiative decay of the (A 0X) complex.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Journal of Magnetism and Magnetic Materials
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SCML 2024
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Macromolecules