Paper
The DX centre
T.N. Morgan
Semiconductor Science and Technology
Paper
Positive mode silylation process characterization
Abstract
In this paper we wish to report on our progress in developing a positive TSI system with emphasis on what we believe is a novel approach for characterizing the silylation process. © 1992.
Related
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
J.K. Gimzewski, T.A. Jung, et al.
Surface Science
K.N. Tu
Materials Science and Engineering: A