Conference paper
Enabling Next Generation CMOS by Novel EOT Scaling Module
Lin Dong, Steven Hung, et al.
VLSI Technology 2021
In this work, we present and review a physics-based statistical model recently developed for our experimental findings of the reverse BD area scaling using hydrogen-plasma-treated HfO2 ReRAM devices, demonstrating no fundamental reason preventing the old scaling law from being reversed or altered, thus providing a solution for ReRAM technology scaling.
Lin Dong, Steven Hung, et al.
VLSI Technology 2021
Akihiro Horibe, Yoichi Taira, et al.
IEDM 2025
Chun-chia Brown Lu, Saumya Gulati, et al.
ANS 2025
Pritish Parida
DCD Connect NY 2025