Skip to main content
Research
Focus areas
Blog
Publications
Careers
About
Back
Focus areas
Semiconductors
Artificial Intelligence
Quantum Computing
Hybrid Cloud
Back
About
Overview
Labs
People
Back
Semiconductors
Back
Artificial Intelligence
Back
Quantum Computing
Back
Hybrid Cloud
Back
Overview
Back
Labs
Back
People
Research
Focus areas
Semiconductors
Artificial Intelligence
Quantum Computing
Hybrid Cloud
Blog
Publications
Careers
About
Overview
Labs
People
Open IBM search field
Close
Accounts of Chemical Research
Paper
01 May 2002
Silicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride Chemistry
View publication
Abstract
No abstract available.
Related
Conference paper
The study of modified layers in SiCOH dielectrics using spectroscopic ellipsometry
Paper
Corrosion in low dielectric constant Si-O based thin films: Buffer concentration effects
Paper
Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)
Paper
Silane pyrolysis rates for the modeling of chemical vapor deposition
View all publications