S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225-253 nm, was studied with particular emphasis on the "plasma dark space." Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas. © 1985 Plenum Publishing Corporation.
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
J.C. Marinace
JES
K.N. Tu
Materials Science and Engineering: A