Chemical Reviews

Paper

20 Jun 1996

Surface chemistry in the chemical vapor deposition of electronic materials

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Abstract

No abstract available.

Paper

Sequential Lateral Solidification of Silicon Thin Films on Cu BEOL-Integrated Wafers for Monolithic 3-D Integration

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IEEE T-ED

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In Situ Determination of the Effects of CO₂ and Other Volatile Impurities on YBa₂Cu₃O₇__x

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Chemistry of Materials

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Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects - State of the art

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Adsorption kinetics of SiH₄, Si₂H₆ and Si₃H₈ on the Si(111)-(7×7) surface

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