Conference paper
Ta/polyimide adhesion durability
A.C. Callegari, B.K. Furman, et al.
ESSDERC 1992
The thermal stability of polycrystalline silicon/metal oxide interfaces was investigated by using transmission electron microscopy (TEM). TEM showed strong reactions at the poly-Si/metal oxide interface when annealed at 1000°C. It was found that the thermal stability of polycrystalline silicon/metal oxide interface was significantly enhanced when the poly-Si was plasma deposited using silane diluted in He.
A.C. Callegari, B.K. Furman, et al.
ESSDERC 1992
A.C. Callegari, M. Murakami, et al.
ESSDERC 1987
A. Paccagnella, A.C. Callegari, et al.
Applied Physics Letters
A.C. Callegari, G.D. Spiers, et al.
Journal of Applied Physics