Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Accurate measurement of inversion thickness is essential in ULSI technology for development and control of ultra-thin gate dielectric processes. However, the accuracy of the measurement can be severely affected by the high gate leakage current and series resistance. This paper presents a methodology to reduce the measurement error by optimizing the ac modulation frequency and test device structures.
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules
A. Krol, C.J. Sher, et al.
Surface Science
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano