Lithography
- A.D. Wilson
- 1991
- ACS Spring 1991
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15 results for Alan Wilson
1 µm MOSFET VLSI Technology: Part VI― Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE JSSC
0.5 μm CMOS devices and circuits fabricated using synchrotron X-ray lithography
- L.K. Wang
- C.H. Hsu
- et al.
- 1989
- VLSI Technology 1989
Fully scaled 0.5 micron CMOS technology using variable shaped electron beam lithography
- Philip Coane
- Paul Rudeck
- et al.
- 1989
- Proceedings of SPIE 1989
Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
X-ray lithography: Can it be justified
- Alan D. Wilson
- 1989
- Proceedings of SPIE 1989
Electron beam pattern writer for x-ray masks
- R. Viswanathan
- A.D. Wilson
- et al.
- 1989
- Proceedings of SPIE 1989
Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- J. Silverman
- V. Dimilia
- et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering