2nd Generation dual-channel optimization with cSiGe for 22nm HP technology and beyond
- C. Ortolland
- Daniel Jaeger
- et al.
- 2013
- IEDM 2013
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86 results for Phil Oldiges
Ab initio study of metal grain orientation-dependent work function and its impact on FinFET variability
- Samarth Agarwal
- Rajan Kumar Pandey
- et al.
- 2013
- IEEE T-ED
Meeting the challenge of multiple threshold voltages in highly scaled undoped FinFETs
- Ramachandran Muralidhar
- Jin Cai
- et al.
- 2013
- IEEE T-ED
Channel doping impact on FinFETs for 22nm and beyond
- Chung-Hsun Lin
- R. Kambhampati
- et al.
- 2012
- VLSI Technology 2012
Simulation of phonon-induced mobility under arbitrary stress, wafer and channel orientations and its application to FinFET technology
- Kai Xiu
- Phil Oldiges
- 2012
- SISPAD 2012
Investigation of the Impact of Random Dopant Fluctuation on Static Noise Margin of 22nm SRAM
- Sarah Q. Xu
- Kai Xiu
- et al.
- 2012
- SISPAD 2012
A comparison of short-channel control in planar bulk and fully depleted devices
- Ramachandran Muralidhar
- Jin Cai
- et al.
- 2012
- IEEE Electron Device Letters
Critical analysis of 14nm device options
- Phil Oldiges
- R. Muralidhar
- et al.
- 2011
- SISPAD 2011
Impact of substrate bias on GIDL for thin-BOX ETSOI devices
- Pranita Kulkarni
- Q. Liu
- et al.
- 2011
- SISPAD 2011
Sub-25nm FinFET with advanced fin formation and short channel effect engineering
- Tenko Yamashita
- Veeraraghvan S. Basker
- et al.
- 2011
- VLSI Technology 2011