Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
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54 results for Donald C. Hofer
Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Design of an etch-resistant cyclic olefin photoresist
- Robert D. Allen
- Juliann Opitz
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Influence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization
- Hiroshi Ito
- G. Breyta
- et al.
- 1995
- Microlithography 1995
Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994
Molecular composites and molecular order of rigid polyimides
- D.Y. Yoon
- M. Ree
- et al.
- 1988
- International Conference on Polyimides 1988
SYNTHESIS AND PROPERTIES OF SEGMENTED POLY(HYDROXYETHER-SILOXANE) COPOLYMERS.
- J.L. Hedrick
- B. Haidar
- et al.
- 1986
- ACS Division of Polymer Chemistry Anaheim Meeting 1986
Modeling planarization with polymers
- Debra B. LaVergne
- Donald C. Hofer
- 1989
- Proceedings of SPIE 1989