Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators
- Lynn T.-N. Wang
- Liang-Teck Panga
- et al.
- 2009
- SPIE Advanced Lithography 2009
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10 results for Andrew R. Neureuther
Contrast enhanced UV lithography with polysilanes
- Donald C. Hofer
- Robert D. Miller
- et al.
- 1984
- Microlithography 1984
Characterization of the induction effect at mid-ultraviolet exposure: Application to AZ2400 at 313 nm
- Donald C. Hofer
- Grant Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Proximity effects and influences of nonuniform illumination in projection lithography
- P.D. Robertson
- F.W. Wise
- et al.
- 1989
- Proceedings of SPIE 1989
Resist characterization: Procedures, parameters, and profiles
- M. Exterkamp
- W. Wong
- et al.
- 1989
- Proceedings of SPIE 1989
Characterization of a Photoresist with Wavelength Selected Tone
- Lester A. Pederson
- Andrew R. Neureuther
- et al.
- 1990
- IEEE T-ED
COMPARISON OF BACKSCATTERED ELECTRON AND OPTICAL IMAGES FOR SUBMICRON DEFECT DETECTION.
- Michael G. Rosenfield
- Douglas S. Goodman
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Application of Line-Edge Profile Simulation to Thin-Film Deposition Processes
- Andrew R. Neureuther
- Chiu H. Ting
- et al.
- 1980
- IEEE T-ED
Application of Line-Edge Profile Simulation to Thin-Film Deposition Processes
- Chiu H. Ting
- Chen-Yih Liu
- 1980
- IEEE Journal of Solid-State Circuits
Machining Integrated Optical Structures in Photoresist
- F.H. Dill
- A.R. Neureuther
- 1973
- IEEE T-ED