Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon
- J. Paraszczak
- J. Heidenreich
- et al.
- 1985
- Microelectronic Engineering
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36 results for Jurij Paraszczak
A new method for determining electron beam proximity correction parameters in a double layer siloxane-diazo resist system
- Fletcher Jones
- Jurij Paraszczak
- et al.
- 1984
- Journal of Applied Physics
SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.
- J. Paraszczak
- E. Babich
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
POLYSILOXANE RESIST AS A PROBE FOR ENERGY DEPOSITED IN ELECTRON BEAM EXPOSED RESISTS.
- D. Kern
- J. Paraszczak
- et al.
- 1982
- Microcircuit Engineering 1982
Multilayer resist systems using polysiloxanes as etch masks
- J. Paraszczak
- J.M. Shaw
- et al.
- 1983
- Microlithography 1983
RD3D 〈Computer Simulation of Resist Development in Three Dimensions〉
- Fletcher Jones
- Jurij Paraszczak
- 1981
- IEEE T-ED