Enhanced grain growth of polycrystalline silicon at low temperature by dopant redistribution
- T.C. Chou
- C.Y. Wong
- et al.
- 1987
- Journal of Applied Physics
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34 results for C.Y. Wong
Lattice imaging of metastable TiSi2
- T.C. Chou
- C.Y. Wong
- et al.
- 1987
- Journal of Applied Physics
Cross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate
- C.Y. Wong
- F.S. Lai
- et al.
- 1986
- Journal of Applied Physics
Enhanced grain growth of phosphorus-doped polycrystalline silicon by titanium silicide formation
- T.C. Chou
- C.Y. Wong
- et al.
- 1986
- Applied Physics Letters
X-ray photoelectron spectroscopy on surface oxidation of silicon by some cleaning procedures
- C.Y. Wong
- S. Klepner
- 1986
- Applied Physics Letters
Thermal stability of TiSi2 on mono- and polycrystalline silicon
- C.Y. Wong
- L.K. Wang
- et al.
- 1986
- Journal of Applied Physics
Ambient and dopant effects on boron diffusion in oxides
- C.Y. Wong
- F.S. Lai
- 1986
- Applied Physics Letters
Arsenic segregation to silicon/silicon oxide interfaces
- C.Y. Wong
- C.R.M. Grovenor
- et al.
- 1985
- Journal of Applied Physics
Effect of arsenic segregation on the electrical properties of grain boundaries in polycrystalline silicon
- C.Y. Wong
- C.R.M. Grovenor
- et al.
- 1985
- Journal of Applied Physics
Grain growth study in aluminum films and electromigration implications
- Subramanian S. Iyer
- C.Y. Wong
- 1985
- Journal of Applied Physics